MagIC” at Tyndall: Making Magnetics Disappear into ICs using Stripline Inductors with Laminated CZT Magnetic Cores

The Tyndall FAMES team announces the successful full-wafer fabrication of stripline inductors with laminated CZT magnetic cores. Achieving ultra-compact size at the chip level, these components overcome the “bulky magnetics” bottleneck, enabling seamless integration with advanced FD-SOI technologies in power management ICs.

The Challenge: Shrinking the Giants of Power Electronics

In modern power management systems, magnetic components for energy storage remain the primary bottleneck. The challenge lies at the intersection of material science, electromagnetics, and nanofabrication: how can we make an inductor as compact as silicon ICs without sacrificing efficiency?

On-silicon magnetic technology is the key enabler for this transition. By bringing efficient magnetic components to the chip level, we enable a new generation of integrated power management systems. This technology allows for the potential co-integration of magnetics directly with Fully Depleted Silicon-On-Insulator (FD-SOI) power management ICs, significantly improving power density and performance.

Driving Innovation through FAMES

Within the framework of the FAMES project, our primary mission has been to bridge the gap between theoretical magnetic performance and scalable silicon fabrication. FAMES provided the collaborative ecosystem necessary to refine the integration of laminated thin-film CZT (Cobalt-Zirconium-Tantalum) magnetic cores into a standard silicon workflow, ensuring that these high-performance materials could be processed reliably at scale.

Milestones: Successful Full-Wafer Fabrication

In the fabrication run completed in December 2025, we achieved the successful production of on-silicon stripline inductor wafers. Utilizing 100 mm wafers, we fabricated hundreds of individual inductors in a single fabrication run. Each component was designed to meet rigorous power converter system specifications, ensuring industrial relevance from the outset.

The subsequent measurement validation phase has confirmed the success of the run. We evaluated critical performance metrics, including inductance values in the range of 3–5 nH and a peak quality factor (Q) exceeding 8, all within an inductor thickness of only 30 µm. Notably, the results for DC and AC resistance, alongside the Q-factor analysis, demonstrate that these laminated CZT cores offer the high-frequency efficiency required for next-generation power applications.

A Strategic Leap Forward

This achievement represents a pivotal step for the FAMES project. Beyond the successful material and process development, this run provides a library of validated samples for future heterogeneous integration into power electronic systems. By proving that multiple designs can coexist on the same wafer, we have laid the foundation for the delivery of inductor samples to the ACCESS project, a complementary EU initiative, scheduled for late 2026.

Full inductor fabrication wafer with hundreds of inductors fabricated on and the zoom-in photo for an example inductor coupon.
Full inductor fabrication wafer with hundreds of inductors fabricated on and the zoom-in photo for an example inductor coupon. © Tyndall National Instutite

Scientific contacts and contributors

Yi Dou, Sambuddha Khan, Cian O’ Mathuna (Tyndall National Institute)

Explore FAMES technologies

Find out more about FAMES Small inductors for DC-DC converters.

Editorial – FAMES Newsletter #3
Come learn how you, too, can access the FAMES Pilot Line technologies! Join us in Brussels, Belgium on March 18, 2025....
Meet a FAMES’ researcher: Interview with Claire Fenouillet-Béranger
Claire Fenouillet‑Béranger is Director of Research and Fellow Expert at CEA‑LETI, internationally recognized for her pioneering work in advanced device integration and her two decades of leadership in FD‑SOI technology,...
CEA-Leti and Fraunhofer IPMS Validate Wafer Exchange for Ferroelectric Memory Materials Within the FAMES Pilot Line
CEA-Leti and Fraunhofer IPMS have successfully completed the first exchange of ferroelectric memory wafers within the FAMES Pilot Line, marking a pivotal milestone in establishing a shared European platform for...

Related news

Subscribe to the newsletter

Keep up to date with the latest news from FAMES

All FAMES Partners undertake to respect their obligations in application of regulations in force and, especially, regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016, on the protection of natural persons with regard to the processing of personal data and on the free movement of such data (referred to as “GDPR”).

Contact

Leader of Work Package ​​3D and heterogeneous integration

Lilian Masarotto (CEA-Leti), Senior project manager

Request submitted!

Thank you for your registration. You will receive a copy by email. We will be getting in touch with you shortly to confirm or not your registration to the Winter school.

If you encountered an error or did not receive a copy (please check your spam), contact us.

FAMES European FD-SOI Design School (EFDS)

Winter School – 25-30 January 2026, Grenoble,  France
training costs: 1960€

All FAMES Partners undertake to respect their obligations in application of regulations in force and, especially, regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016, on the protection of natural persons with regard to the processing of personal data and on the free movement of such data (referred to as “GDPR”).

Spontaneous User Request

Please note that your answers will help us establish the eligibility of your request.

If you selected "3D Heterogeneous Integration Process Modules", please provide more details, otherwise please proceed to the next step.

All FAMES Partners undertake to respect their obligations in application of regulations in force and, especially, regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016, on the protection of natural persons with regard to the processing of personal data and on the free movement of such data (referred to as “GDPR”).

Request submitted!

Thank you for your request. You will receive a copy by email. We will be getting in touch with you shortly.

If you encountered an error or did not receive a copy (please check your spam), contact us at open-access-chair@fames-pilot-line.eu.

FAMES Open-Access Call User Request

Please note that your answers will help us establish the eligibility of your request.

All FAMES Partners undertake to respect their obligations in application of regulations in force and, especially, regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016, on the protection of natural persons with regard to the processing of personal data and on the free movement of such data (referred to as “GDPR”).

Spontaneous User Request

Please note that your answers will help us establish the eligibility of your request.

All FAMES Partners undertake to respect their obligations in application of regulations in force and, especially, regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016, on the protection of natural persons with regard to the processing of personal data and on the free movement of such data (referred to as “GDPR”).

Contact

Open Access chair person - FAMES Pilot Line

Open Access Chairperson

Susana Bonnetier (CEA-Leti)

For inquiries or problems regarding the Open Access/Spontaneous Request, you can contact us directly.

Trainings

CV :

Annual call