Continuing our “FAMES Researcher Portraits” series“FAMES Researcher Portraits” series, which highlights the people who drive the project forward, we are pleased to feature Claire Fenouillet‑Béranger, Director of Research and Fellow Expert at CEA‑LETI, currently leading the 10 nm FD‑SOI integration at LETI and WP4 within FAMES.
Claire Fenouillet-Béranger is recognized for her researches in advanced devices integration and especially for her expertise in FD-SOI technology for the past twenty years. Since 2021, she is in charge of the 10nm FD-SOI integration development at LETI and, WP4 leader (FD-SOI FEOL integration) in the FAMES project.
The development of 10 nm FD-SOI technology requires significant device scaling while simultaneously improving performance to meet the target specifications. Addressing this challenge demands the introduction of new architectural concepts and advanced process building blocks. Among the available performance boosters, strain engineering remains a key enabler and can be implemented either at the wafer level or locally at the device level. Additional process modules are also necessary to reduce access resistance and further enhance device performance. In this context, the integration of in-situ doped, faceted raised source/drain regions becomes essential. Furthermore, reaching the aggressive contacted poly pitch (CPP) target of 68 nm requires the adoption of advanced lithography schemes as Self-Aligned Double Patterning (SADP), to ensure the required density scaling.
The in-situ doped, faceted raised source and drain heavily doped with phosphorus (Si:P) for NMOS and SiGe:B for PMOS are introduced to reduce access resistance and enhance device performance. Depending on the epitaxial growth conditions, strain can also be intentionally introduced in the source and drain regions. The key challenge is to find the right balance between achieving a sufficiently high doping level to minimize access resistance while optimizing the annealing process to activate dopants without inducing excessive diffusion for leakage control.
FAMES is a unique opportunity to accelerate the development of key technological topics through the synergy of leading European partners. It enables, throughout the purchased of new generation tools, the integration of advanced building blocks for the development of the next generation of FD-SOI nodes and assessing their technological and industrial viability.
Current developments have been carried out using relaxed (28 nm) design rules, yielding promising results. The next step is to integrate all the different building blocks, and especially the strain options, into a mask set based on 10 nm design rules.
Find out more about the FAMES consortium.
Website designed and made by Perceptiom and FAMES
FAMES is a European Union’s Horizon Europe Research and Innovation programme
Website designed and made by Perceptiom and FAMES
Website designed and made by Perceptiom and FAMES
Ferrite Circulators: Theory, Design and Simulation
12 October 2026
Cost: 150€
All FAMES Partners undertake to respect their obligations in application of regulations in force and, especially, regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016, on the protection of natural persons with regard to the processing of personal data and on the free movement of such data (referred to as “GDPR”).
Keep up to date with the latest news from FAMES
All FAMES Partners undertake to respect their obligations in application of regulations in force and, especially, regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016, on the protection of natural persons with regard to the processing of personal data and on the free movement of such data (referred to as “GDPR”).
Request submitted!
Thank you for your registration. You will receive a copy by email. We will be getting in touch with you shortly to confirm or not your registration to the Winter school.
If you encountered an error or did not receive a copy (please check your spam), contact us.
FAMES European FD-SOI Design School (EFDS)
FAMES European FD-SOI Design School (EFDS)
January 25-29, 2027
Training costs: 1400€
All FAMES Partners undertake to respect their obligations in application of regulations in force and, especially, regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016, on the protection of natural persons with regard to the processing of personal data and on the free movement of such data (referred to as “GDPR”).
Request submitted!
Thank you for your request. You will receive a copy by email. We will be getting in touch with you shortly.
If you encountered an error or did not receive a copy (please check your spam), contact us at open-access-chair@fames-pilot-line.eu.
FAMES Open-Access Call User Request
Please note that your answers will help us establish the eligibility of your request.
All FAMES Partners undertake to respect their obligations in application of regulations in force and, especially, regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016, on the protection of natural persons with regard to the processing of personal data and on the free movement of such data (referred to as “GDPR”).
Spontaneous User Request
Please note that your answers will help us establish the eligibility of your request.
All FAMES Partners undertake to respect their obligations in application of regulations in force and, especially, regulation (EU) 2016/679 of the European Parliament and of the Council of 27 April 2016, on the protection of natural persons with regard to the processing of personal data and on the free movement of such data (referred to as “GDPR”).
Contact
Susana Bonnetier (CEA-Leti)
For inquiries or problems regarding the Open Access/Spontaneous Request, you can contact us directly.
Trainings
Annual call
