SAL receives Applied Materials PECVD tool for 200mm dielectrics thin films deposition

Silicon Austria Labs has received its Centura™ PECVD tool from Applied Materials, supporting dielectrics deposition for RF circulators on 200mm wafers. The tool is in commissioning phase and targets the end of 2025 for full qualification.
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Centura™ PECVD tool - © Applied Materials (AMAT)

Silicon Austria Labs has received its Centura™ PECVD tool from Applied Materials, supporting dielectrics deposition for RF circulators on 200mm wafers. The tool is in commissioning phase and targets the end of 2025 for full qualification.

In support of the FAMES Pilot Line, Silicon Austria Labs (SAL) is expanding its capabilities in semiconductor process development and is also developing RF circulators on 200 mm wafers. The Plasma Enhanced Chemical Vapor Deposition (PECVD) system from Applied Materials enables dielectrics deposition on 200mm wafers. This addition is vital for the development of advanced materials and processes, particularly for the fabrication of RF circulators within the FAMES pilot line, to support novel device architectures, and address new integration challenges.

Through FAMES, SAL was able to invest in this cutting-edge equipment, accelerating its ability to develop, qualify, and transfer advanced CVD processes. The collaborative framework and shared infrastructure strategy of FAMES allowed us to align this purchase with broader pilot line objectives, leveraging funding, visibility, and strategic alignment across partners.

This installation marks a key step toward building a complete process capability chain within the FAMES Pilot Line. The PECVD tool enhances our capacity for material innovation, supports TRL progression, and ensures high-quality dielectrics deposition on 200 mm wafers—an essential requirement for scalable and reliable semiconductor technologies. Indeed, the high-quality dielectrics deposited on 200 mm wafers by the PECVD tool are critical to the plan for the insulating and passivation layers of the RF circulators developed by SAL within the FAMES project.

The tool will enable the development of high-performance thin films for RF devices (including circulators), MEMS, photonics, and sensor applications, while also supporting process integration for next-generation ICs. It will serve both industrial partners and research stakeholders across Europe, reinforcing the EU’s semiconductor innovation ecosystem.

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